Vol 2 , Issue 2 , April - June 2014 | Pages: 224-232 | Research Paper
Received: March 02, 2014 | Revised: April 10, 2014 | Accepted: May 30, 2014 | Published Online: June 15, 2014
Author Details
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The surface temperature is required to specifying the temperature of the evaporating gold using constant elements for turn off the refinement in the post-processing settings. The paper represents the modeling of nano scale gold film by computing the film thickness, mass deposited on the substrate and mass transfer rate with time dependent model using BDF solver. Gold is evaporated from a resistively heated evaporator source at a temperature of 2000K onto a surface held on a fixed surface. The film thickness varies between 34nm to 39 nm across the sample after 60 sec of deposition, with radial symmetry about the midpoint of the source. The film thickness as well as mass deposited at a point increases linearly with time. Since the angular distribution is of particular interest in this model, by increasing the integration resolution to a maximum value for ensuring the most accurate angular resolution when computing the flux.
Keywords
Physical Vapor Deposition; Modeling; Film Thickness Simulation; Gold Evaporation; Thin Film Deposition.