Journal Press India®

To Study Effect on Current Due to Channel Length Variation

Vol 2 , Issue 4 , October - December 2014 | Pages: 30-32 | Research Paper  

https://doi.org/10.51976/ijari.241406

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Author Details ( * ) denotes Corresponding author

1. Abneesh Kumar, Department of Electronic and Compunction Engineering, IIMT Engineering College, Meerut, Uttar Pradesh, India (neeraj1604@gmail.com)
2. Atal Rai, Department of Electronic and Compunction Engineering, IIMT Engineering College, Meerut, Uttar Pradesh, India
3. RK Saxena, Department of Electronics Instrumentation and Control Engineering, Institute of Engineering & Technology, Alwar, Rajasthan, India
4. Suresh Patel, J.T.O, BSNL, Jamnagar, Gujarat, India

There are two primary device structures that have being widely used. One is the bulk structure, where a transistor is directly fabricated on the semiconductor substrate. The other one is called SOI (silicon-on-insulator), where a transistor is built on a thin silicon layer, which is separated from the substrate by a layer of insulator or device scaling; it is basically try to balance two things: device functionality and device reliability. Both of them have to be maintained at a smaller dimensional size [1]. In this paper, three transistors are proposed having different channel lengths 8 micron, 16 micron and 24 micron. Simulation shows that with a fixed gate length, when channel length is increased, the output characteristics slope is decreased.

Keywords

Channel Length; Threshold Voltage; Drain Current


  1. Zhibin Ren, NANOSCALE MOSFETS: physics, simulation and design:- A Thesis

  2. K. Niranjan, S. Srivastava, J. Singh, M. Tiwari, Comparative Study: MOSFET and CNTFET and the Effect of Length Modulation, IJRTE 1(4), 2012

  3. BSIM3v3 Manual, UC Berkeley

  4. R. van Langevelde, Nat. Lab. Unclassified Report 11NL-UR 2001/813, MOS MODEL LEVEL-1100, issue: June 2004, Koninklijke Philips Electronics N.V. 2004, 26,29,37

  5. Yau, L.D. A simple theory to predict the threshold voltage of short-channel IGFETs, Solid-State Electronics, 1974, 1059

  6. Donald A. Neaman, Semiconductor Physics and Devices, University of Maxico, TMH, 517-518

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